Name: Fuego de oxidación LPCVD de 8/6/4/2 pulgadas de automatización completa Control de oxígeno bajo Deposición de película delgada
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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Fuego de oxidación LPCVD de 8/6/4/2 pulgadas de automatización completa Control de oxígeno bajo Deposición de película delgada

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April 27, 2025

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Descripción del vídeo:

Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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